■Ushio launches atmospheric pressure plasma irradiation unit, one of the smallest unit sizes in the industry
■Fujifilm to Enhance its Production Capacity of CMP Slurries at the Kumamoto Site
■UBE Decides to Increase Production Capacity of High-purity Nitric Acid for Semiconductor
■Nippon Soda and Kyulux sign capital and business alliance agreement to establishmass production system for OLED emitting materials
■Sumitomo Electric Signs a Contract with DPS for International Resource Circulation through Recovery of Rare Metal from Wastewater during FPC Manufacturing
■Fujifilm Launches EUV Resist and EUV Developer
■SCREEN Semiconductor Solutions transferred Laser Systems & Solutions of Europe SASU' all stock to Sumitomo Heavy Industries
■Mitsubishi Chemical Group Expands Production Capacity for Ion Exchange Resins Used in the Production of Ultrapure Water for Semiconductors
■Toppan Photomask to Rebrand as Tekscend Photomask
■DENSO and ROHM Agree to Start Consideration of Strategic Partnership in the Semiconductor Field
■Fujifilm to Invest 20 Billion yen in Japan to Expand Semiconductor Materials Business
■Canon delivers nanoimprint lithography system for semiconductor manufacturing to the Texas Institute for Electronics
■Sony Semiconductor Solutions to Release 0.44-Type Full HD OLED Microdisplay
■AGC Establishes a New Technical Service Site in Taiwan for Chemical Products Focused on Semiconductor and Electronic Materials
■JDI Develops World's First Automotive Grade Dual Touch 2 Vision Display
■SCREEN MIRAI Laboratory Established at Osaka University Graduate School of Engineering