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The Total Solution Exhibition for Electronic Equipment 2024 (June 12 - 14) |
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June 12 - 14th, The Total Solution Exhibition for Electronic Equipment 2024 was held in Tokyo Big Sight. Main topics are picked up. Atsugi Micro exhibited Soar's PM-OLED
Specific Cu series powder can be sintered at low temperature in atmosphere As concerns flexible device such as FPC, Mitsui Metal introduced a specific Cu series powder, is sintered at low temperature in atmosphere. It's composed of pure Cu powder and specific additive agent. After printing this Cu series paste on the substrate, Cu grain is covered with additive agent in annealing process at 200 Ž. For this reason, this film is not oxidized at film state, and then, its specific resistance is relatively low same as 10-5 ƒ¶¥cm order. The company supplies this Cu series power to paste makers. Wiring electrode with 3D shape is formed by polyaniline + plating Cu
As you can image easily, polyaniline is good correspondence with stretch, as a result, breaking don't occur. Furthermore, initially specific resistance same as 10-6 ƒ¶¥cm is kept after stretch because of deposition of Cu after fixed polyaniline wiring. However, printing resolution is 100 ƒÊm order at the present moment because of non-optimization of printing process. MEC appealed Cu selective roughening etchant and selective etchant
As figure 1, if the former is used in wet-etching process, Cu film only is roughed, and other metals such as Ni, Sn, Ag, Au are not roughed because of great difference of wet-etching ratio. On the other hand, the latter is used in case of mixed environment of Cu/Al film and Ni film, Cu seed only is etched. In fact, typical etching ratio of Cu is 0.41 ƒÊm/min, on the other hand, Co is 0.05 ƒÊm/min, Mo is 0.02 ƒÊm/min, In is 0.02 ƒÊm/min, Ag is 0.01 ƒÊm/min, and those of Ni, Al, Ti, Ta, Nb, W, Bi, Au, ITO, Pt, Si are almost 0 ƒÊm/min. Backlight of Mini-LED is manufactured by laser direct drawing system
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