JPCA Show 2018 New movement in the direct exposure system attracts someone's
attention
June 6-8, JPCA Show 2018 were held in Tokyo Big Sight. Main topics in this
exhibition are picked up.
First of all, SCREEN PE Solutions merchandised a direct exposure system “LANZAN” for PCB enormously.
In this system, world highest resolution same as 8 μm order can be gained by an original exposure engine, which was newly developed this time. And also, it's possible to treat at one-pass operation by scanning 5 exposure heads at the same time. Furthermore, throughput was enhanced by non-stop alignment method.
Direct DLP exposure system for the screen mask will be released near future
Picture 1. The screen mask which was pilot-manufactured by the direct exposure |
On the other hand, Seria Corporation appealed a direct exposure system for the screen mask. The company will release at this autumn not only this system, but also a screen mask, which will be manufactured by this system.
This system is based on DLP (Digital Light Processing) technology. In this system, coated photosensitive emulsion on the screen mesh is directly exposed by irradiation of ON/OFF controlled UV light. In short, an original photo mask is not necessary. Users can self-manufacture a screen mask at will. System price is considered to be 40 - 50 million yen. The tact time is depend on pattern resolution, for example, 400 × 500 ㎜ size is approximate 20 minutes. As picture 1, a screen mask (frame size 400 × 500 ㎜) was exhibited in the booth.
Cured Cu paste in atmosphere appeared on the scene
Picture 2. Printed sample of Cu paste |
With respect to electric materials, Goo Chemical introduced a Cu paste
which was cured in atmosphere environment, for the screen printing method.
In spite of use of the conventional μm size powder in this paste, after
printing, practical specific resistance same as 2 × 10-5Ω･cm is gained by annealing at 150 ℃ for 30 minutes in atmosphere environment.
However, cured film is not composed of only Cu, is inclusive of an organic
binder for securement of dispersibility. Typical density is 89 %, and viscosity
is 100 Pa･s.
Plastic film sample with printed fine Cu pattern (L&S ＝ 30 μm/30 μm) was exhibited in the booth. The company demonstrated that this material was suitable for a low thermal resistance substrate such as a plastic film.
Rotary type IGZO sputtering target was exhibited
Picture 3. Rotary type IGZO sputtering target
|
Mitsui Mining & Smelting exhibited a IGZO (In-Ga-Zn-O) sputtering target
for rotary sputtering deposition process. In the deposition process, this
rotary target is rotated, as a result, sputtering erosion is uniformed.
For this reason, high utilization ratio same as 70 - 80 % is gained. This
is almost double value of the planer target. Exhibited product is 400 ㎜
width and 4N purity. As you can image easily, this product is used in the
mass-production line of display makers. |
