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FPD/PCB NEWS`October 13
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This technology enables patterning with a minimum linewidth of 14 nm, equivalent to the 5-nm-node required to produce most advanced logic semiconductors which are currently available. Furthermore, with further improvement of mask technology, it is expected to enable circuit patterning with a minimum linewidth of 10 nm, which corresponds to 2-nm-node. |
FPD/PCB NEWS`October 12
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FPD/PCB NEWS`October 3
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The organization, which is being re-named FUJIFILM Electronic Materials Process Chemicals, is part of Fujifilm's growth strategy to further position the business as a leader in semiconductor materials manufacturing. |