Stella developed a high-end measuring & AOI system, to corresponds
700 × 800 o substrate
▲ST-7080F
▲Granite gantry
Stella Corporation succeeded to develop a high-end measuring & AOI
system "ST-7080F", was able to correspond 700 × 800 o substrate,
as a new product of measuring & AOI system (ST series). It's effective
for screen mask, photo mask, high-end PCB, wet-etching fabricated product,
and so on. The company will start operation demonstration of this system
using actual user's test sample in a short time.
In this system, granite was adopted as not only xy stage but also column gantry, in order to minimize resistance against vibratility. In spite of stepping motor & ball screw driving, maximum precision was obtained among ST series. In fact, positioning accuracy was approximate (2+L/250)μm. And also, setting space could be greatly reduced compared to conventional systems because of y stage and x gantry.
As regards AOI function, minimum pixel size are 170 nm, 350 nm, 700 nm,
1700 nm respectively, and minimum detected defect size are 500 nm, 1000
nm, 2000 nm, 5000nm respectively. Furthermore, 60 nm minimum pixel size
and 250nm minimum detected defect size will be gained in near future, too.
.
Stella Corporation Co., Ltd.
1-1544-7 Kaijincho Minami, Funabashi, Chiba, Japan
Zip: 273-0024
Tel: +81-(0)47-432-5031
Fax: +81-(0)47-432-5032
e-Mail support@stellacorp.co.jp https://www.stellacorp.co.jp